突破1奈米製程超越矽極限!台大攜台積電、MIT 研發二維材料+鉍
台大聯手台積電、MIT自2019 年展開跨國研究,首先由 MIT 團隊發現在二維材料上混搭半金屬鉍的電極,能大幅降低電阻並提高傳輸電流;隨後台積電研究將鉍沉積製程進行優化,台大團隊並運用氦離子束微影系統(Helium-ion beam lithography)將元件通道成功縮小至奈米尺寸,終於獲得這項突破性的研究成果。....
同時也有10000部Youtube影片,追蹤數超過2,910的網紅コバにゃんチャンネル,也在其Youtube影片中提到,...
ion beam lithography 在 (PDF) Focused Ion Beam Lithography - ResearchGate 的相關結果
higher resist sensitivity to ions increases the throughput in contrast to EBL. A speciality of ion beam direct-write lithography is the possibility for ... ... <看更多>
ion beam lithography 在 Resists for Helium Ion Beam Lithography: Recent Advances 的相關結果
Helium ion beam lithog. (HIBL) is an emerging technique that uses a sub-nanometer focused beam of helium ions generated in the helium ion ... ... <看更多>
ion beam lithography 在 Beam Lithography - an overview | ScienceDirect Topics 的相關結果
Ion beam lithography (IBL) or focused ion beam lithography (FIBL) refers to a direct writing process that uses a narrow scanning ion beam source (e.g., ... ... <看更多>